SEMI U
This course provides attendees with an overview of the fundamentals, current status, and technical challenges of EUV Lithography. The course will begin with a review of lithography in general drawing parallels between EUV and DUV lithography. The course will then go on to review EUV specific challenges/solutions including sources (lithography and metrology), optics, metrology, masks, and patterning materials. Two areas where EUV specific challenges are particularly significant are patterning materials and photomasks; this course will cover these two areas in more detail including topics such as resist stochastics, radiation chemistry, reflective thick masks, off-axis mask illumination, phase shift masks, and mask stochastics.
This course is intended for anyone who is involved or interested in the development of EUV Lithography, needs to understand the core technologies related to EUV Lithography, or is interested in learning the fundamentals of this leading patterning technology. The course provides a general overview, and even deeper topics of resist and masks will also be kept at the generalist level- making the course accessible to a broad technical audience.