In semiconductor manufacturing, precise vacuum conditions are essential at nearly every process step—yet requirements vary dramatically. Until now, this meant multiple instruments for total pressure measurement, leak detection, and gas analysis.
We unveil a breakthrough: CASSINI, a single total pressure measurement device with three integrated sensors, delivering unmatched accuracy across the full vacuum range and for various applications.
Building on this, we introduce NOVION—our Time-of-Flight (ToF) mass spectrometer. NOVION uniquely integrates total pressure measurement, helium leak detection, and high-resolution residual gas analysis (RGA) into one compact system. The result: ultra-fast, selective, and highly precise gas diagnostics that streamline workflows, reduce tool footprint, and accelerate decision-making. We will explain its working principle, technical characteristics, and the benefits it offers for industrial applications.
Two key application examples will illustrate NOVION’s and CASSINI's capabilities: 1. Verification of High-Purity Components: UHV and XHV processes require ultraclean vacuum components that are free from heavy hydrocarbons. To achieve this, they must undergo a complex cleaning procedure. We will demonstrate how we implemented a quality control process using NOVION to quickly assess delivery conditions and verify whether our cleaning process has been successful. We will also discuss the technical and qualitative challenges that need to be met in high-volume production.
2. Quality Gate for Load Lock Applications: Load lock chambers are critical components in semiconductor manufacturing, as they serve to introduce wafers into a vacuum environment without contaminating the main process chamber. Unwanted outgassing, for example from a wafer, can disrupt the process chambers of other systems, causing significant contamination and process instability. Until now, direct measurement of such outgassing in high-volume manufacturing has not been possible. We will present the current state of the art with CASSINI and show how NOVION could resolve this challenge, enabling real-time monitoring and better control over the vacuum conditions.
