VioNano Innovations Inc. is pioneering a novel brush polymer technology that enhances semiconductor manufacturing, allowing integrated circuit makers to achieve next-generation feature sizes using their existing deep ultraviolet (DUV) lithography tools. Our self-limiting coating is applied to existing semiconductor features to precisely pattern smaller designs, effectively doubling feature density, improving yield, and reducing line-edge roughness. This innovation provides a sustainable and cost-effective alternative to prohibitively expensive extreme ultraviolet (EUV) lithography, saving fabs billions in capital upgrades while drastically cutting energy consumption. By addressing the industry's critical challenges of escalating costs and supply chain vulnerabilities, our technology enables a more robust and sustainable path to future node scaling. Currently demonstrating our process on 300 mm wafers, VioNano is raising a pre-seed round and seeking strategic partners to accelerate development and commercialization.
