Magnetron sputtering has long been recognized for its ability to produce thin films with exceptional properties and high process stability. The OPTA X precision sputtering system takes this a step further by combining double-sided coating and co-sputtering capabilities, eliminating the need for substrate flipping during double-sided coatings. This advancement not only enhances productivity but also improves substrate handling, reducing deflection during the coating process for higher precision.
Developed by VON ARDENNE, the OPTA X is a rotary disk system performing META, CARS and REACTIVE MODE sputtering. Its ability to deposit layers in both upward and downward directions (sputter up/down) provides unparalleled flexibility for a wide range of applications. The system includes an in-situ optical monitoring system capable of measuring up to several hundred layers, ensuring precise control and real-time feedback through the MOCCA+® software. In META mode, the system achieves ultrathin layer deposition by sputtering partially oxidized or metallic targets onto substrates during each rotation of the rotary disk, followed by after-reaction processes such as oxidation, nitridation, or hydrogenation using plasma sources.
Key technical highlights of the OPTA X include the ability to coat variable substrate formats up to approximately 320 mm in radial width. Uniformity across the substrate is achieved by optimizing the ion source geometry, rotary disk speed, and sputtering power. The system’s innovative design includes shaper masks in the radial direction to compensate for path speed variations, resulting in exceptional uniformity. For example, a radial uniformity over 300 mm substrate length of ≤±0.25% for Nb2O5 and SiO2, and ≤±0.5% for ITO could be achieved. The system also features adjustable magnet bars that maintain consistent layer thickness profiles throughout the target's lifetime, ensuring reliable performance over extended production runs. Repeatability and stability have been further demonstrated through industrial-grade run-to-run and carrier-to-carrier tests, confirming the reproducibility and reliability of deposition rates in multilayer coatings.
This presentation will introduce the technical and scientific advancements of the OPTA X, showcasing its ability to meet stringent demands in thin-film production. By offering superior uniformity, high reproducibility, and advanced monitoring capabilities, the OPTA X precision sputtering system unlocks new possibilities for industrial applications in fields like semiconductors, precision optics, and silicon photonics. Set to launch in 2026, an in-house tool will be implemented in our cleanroom R&D center, further enhancing our thin-film development capabilities and providing the market with cutting-edge sampling options.
