ICPMS Applications Chemist Agilent Technologies Wilmington, DE, United States
Contamination control is critical in semiconductor device fabrication facilities. Contaminants adversely affect device performance and may be introduced via the wafer substrate, or the chemicals and reagents used during the manufacturing process. The semiconductor industry standard method for monitoring trace element contaminants is ICP-MS, with laboratories increasingly switching to triple quadrupole ICP-MS (ICP-QQQ or ICP-MS/MS) for its superior detection limits. For decades semiconductor labs have been successfully using cool plasma conditions to achieve the lowest Background Equivalent Concentrations (BEC) and Detection Limits (DL) for interfered elements and easily ionized elements.
