Skip to main content
SEMICON West 2025 Main banner

    Jonas Sundqvist

    CEO
    AlixLabs AB
    Lund, Skane Lan, Sweden

    Jonas Sundqvist received his PhD in inorganic chemistry from Uppsala University, Department for Materials Chemistry at The Ångström Laboratory in 2003 where he developed ALD and CVD processes for metal oxide ALD and CVD processes using metal iodides. In 2003 he joined Infineon Memory Development Centre (MDC) as a process engineer for the development of high-k and metal nitride ALD processes. Later at Qimonda (2006) he was a member of the Materials Management team for precursor procurement and acquisition with special focus on ALD precursors for DRAM development and production. In 2009 he joined Fraunhofer Center Nanoelectronic Technologies (CNT) as an expert for thin film deposition with special focus on high-k dielectrics and electrode materials for DRAM, eDRAM, BEOL MIM Cap and HKMG technologies. In 2010 he founded ALD Lab Dresden together with TU Dresden and in 2013 he became Group Leader of High-k Devices Group at Fraunhofer CNT which at the same time became a business unit of Fraunhofer IPMS. In 2014 Jonas Sundqvist founded BALD Engineering, an independent Networking Platform for ALD. In 2015 he spent at Lund University as Laboratory operations manager leading the day-to-day work of Lund Nano Lab, supervising the daily lab activity and taking responsibility of the main infrastructure of Lund Nano Lab. In 2017 he and co-workers from Nano Lund co-founded ALIX Labs AB - a start-up for self-aligned nanopatterning technology. and since 2021 he is CEO. 2015-2020 Jonas was Group Leader at The Fraunhofer IKTS Thin Film Technology Group. Since 2015, he is a Senior Technology Analyst at TECHCET CA LLC for ALD/CVD Precursor and Specialty Electronic Gases, now at full time. Since May 2021 he is Adjunct Senior Lecturer in Inorganic Chemistry at Linköping University, Sweden.

    Jonas Sundqvist has over 20 years of experience, holds 10 patents, and authored or co-authored more than 30 publications in the fields of ALD and CVD process development. He is Conference Co-Chair for the Annual TECHCET/CMCFabs Critical Materials Conference and EFDS ALD For Industry.

    Presentation(s):